HC-064
The Harlan™: HC-064 is a 100mm PHDP-magnetron source technology which includes a newly designed high-density plasma generator with proprietary pulsed output and an advanced retrofittable magnetron deposition source far more superior to any conventional magnetron technology in the market today. This source is designed specifically for the industrial market to be a true alternative to ARC deposition. It can deposit low-stress films without macro-particles with high energy metal ions at high rates in both non-reactive and reactive mode without the need for reactive gas control. The source is user-friendly, reliable and can be easily retrofittable.

Deposition Capabilities: Metal, Metal nitrides, Metal oxides and Metal-DLC.

Applications: Decorative Coatings, Hard Coatings, Tribological Coatings, PVD chrome Plating, and others.

HC-64C
The Harlan™: HC-64C is a 100mm PHDP- Carbon magnetron source technology which includes a newly designed high-density plasma generator with proprietary pulsed output for Carbon discharge and an advanced retrofittable carbon magnetron deposition source far more superior to any conventional magnetron technology in the market today. This PHDP- Carbon magnetron source is the first source which can deposit low-stress hydrogen free DLC films on Si or metal substrates with hardness > 20 Gpa. The source can also be used for taC or a-C:H. This new source allows us to ionize a higher fraction of the carbon material and thus be able to deposit hydrogen free or hydrogenated DLC films. The source is user-friendly, reliable and can be easily retrofittable.

Deposition Capabilities: DLC deposition from a graphite target.

Applications: Decorative Coatings, Hard Coatings, Tribological Coatings, and others.
HC-64CX
The Harlan™: HC-64CX is an extreme ionization 100mm PHDP- Carbon magnetron source technology which includes a newly designed high-density plasma generator with proprietary pulsed output for Carbon discharge and an advanced retrofittable carbon magnetron deposition source far more superior to any conventional magnetron technology in the market today. This PHDP- Carbon magnetron source is the first source which can deposit low-stress hydrogen free DLC films on Si or metal substrates with hardness > 20 Gpa. The source can also be used for taC or a-C:H. This new source allows us to ionize a higher fraction of the carbon material and thus be able to deposit hydrogen free or hydrogenated DLC films. The source is user-friendly, reliable and can be easily retrofittable.

Deposition Capabilities: DLC deposition from a graphite target.

Applications: Decorative Coatings, Hard Coatings, Tribological Coatings, and others.
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